A Chinese start-up has unveiled a prototype extreme ultraviolet (EUV) light-source machine – a component often described as the “heart” of advanced lithography systems – marking an early but critical step in Beijing’s drive for self-reliance in chipmaking equipment.
At the China International Industry Fair in Shanghai, Langdao Silex displayed its self-developed EUV light-source system. Ninety per cent of the machine’s components were localised, with the vast majority of core parts developed in-house, a company representative said, according to a report by Chinese news outlet Jiefang Daily on Tuesday.
On-site staff described the prototype as a crucial step in moving domestically produced EUV light sources from the laboratory to industrial applications, although mass production remained “three to five years away”, according to the report.
